Makyoh topography: A simple yet powerful optical method for flatness and defect characterisation of mirror-like surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5458, Issue , 2004, Pages 86-100

  Riesz, Ferenc ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Curvature measurements; Full field optical characterisation techniques; Makyoh topography; MEMS; Surface defects; Surface flatness; Surface morphology

Indexed keywords

CANTILEVER BEAMS; DEFECTS; MEASUREMENTS; MICROELECTRONICS; MIRRORS; MORPHOLOGY; SINGLE CRYSTALS; SURFACE PHENOMENA;

CURVATURE MEASUREMENTS; FULL-FIELD OPTICAL CHARACTERIZATION TECHNIQUES; MAKYOH TOPOGRAPHY; MICROELECTROMECHANICAL SYSTEMS (MEMS); SURFACE DEFECTS; SURFACE FLATNESS;

MICROELECTROMECHANICAL DEVICES;

EID: 10044285974     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.546018     Document Type: Conference Paper

References (54)

1. K. Takahashi and K. Kawashima, "Evaluations of 300 mm Si wafer performances for giga ULSI device processes", Microel. Engin. 56, 27-39, 2001.
2. J. D. Briers, "Optical testing: a review and tutorial for optical engineers", Opt. Lasers. Engin. 32, 111-138, 1999.
3. T. Muller, R. Kumpe, H. A. Gerber, R. Schmolke, F. Passek and P. Wagner, "Techniques for analysing nanotopography on polished silicon wafers", Microel. Engin. 56, 123-127, 2001.
4. T. Yi and C.-J. Kim, "Measurement of mechanical properties for MEMS materials", Meas. Sci. Technol. 10, 706-716, 1999.
5. M. Zecchino and E. Novak, "MEMS in motion: a new method for dynamic MEMS metrology", R&D Magazine 45, 26-27, 2003.
6. S. Petitgrand, R. Yahiaoui, K. Danaie, A. Bosseboeuf and J. P. Gilles, "3D measurement of micromechanical devices vibration mode shapes with a stroboscopic interferometric microscope", Opt. Lasers. Engin. 36, 77-101, 2001.
7. A. Bosseboeuf and S. Petitgrand, "Characterization of static and dynamic behaviour of M(O)EMS by optical techniques", J. Micromech. Microeng. 13, S23-S33, 2003.
8. M. Kujawińska, "Modern optical measurement station for micro-materials and micro-elements", Sensors Actuators A 99, 144-153, 2002.
9. R. W. Atkinson, "Japanese mirrors", Nature 16, 62, 1877.
10. W. E. Ayrton and J. Perry, "The magic mirror of Japan", Proc. Roy. Soc. 28, 127-148, 1878.
11. G. Saines and M. G. Tomilin, "Magic mirrors of the Orient", J. Opt. Technol. 66, 758-765, 1999.
12. K. Kugimiya, "'Makyoh': The 2000 year old technology still alive", J. Crystal Growth 103, 420-422, 1990.
13. S. Hahn, K. Kugimiya, M. Yamashita, P. R. Blaustein and K. Takahashi, "Characterization of mirror-like surfaces using the magic-mirror method", J. Crystal Growth 103, 423-432, 1990.
14. S. Tokura, N. Fujino, M. Ninomiya and K. Masuda, "Characterization of mirror-polished silicon wafers by Makyoh method", J. Crystal Growth 103, 437-442, 1990.
15. K. Kugimiya, "Characterization of polished surfaces by 'Makyoh'", J. Crystal Growth 103, 461-468, 1990.
16. O. Okabayashi, H. Shirotori, H. Sakurazawa, E. Kanda, T. Yokoyama and M. Kawashima, "Evaluation of directly bonded silicon wafer interface by the magic mirror method", J. Crystal Growth 103, 456-460, 1990.
17. S. Hahn, K. Kugimiya, K. Vojtechovsky, M. Sifalda, M. Yamashita, P. R. Blaustein and K. Takahashi, "Characterisation of mirror-polished Si wafers and advanced Si substrate structures using the magic mirror method", Semicond. Sci. Technol. 7, A80-A85, 1992.
18. S. Hahn, K. Kugimiya, C. B. Yarling, H. Suga, W. L. Smith, P. R. Blaustein and K. Takahashi, "Investigation of rapid-thermal-processing-induced defects in ion-implanted Czochralski silicon by the magic mirror method ", Semicond. Sci. Technol. 7, A86-A90, 1992.
19. K. Kugimiya, "Makyoh topography: comparison with x-ray topography", Semicond. Sci. Technol. 7, A91-A94, 1992.
20. P. Blaustein and S. Hahn, "Realtime inspection of wafer surfaces", Solid State Technol. 32(12), 27-29, 1989.
21. D. Korytár and M. Hrivnák, "Experimental and computer-simulated Makyoh images of semiconductor wafers", Japan. J. Appl. Phys. 32, 693-698, 1993.
22. Z. J. Laczik, "Quantitative Makyoh topography", Opt. Eng. 39, 2562-2567, 2000.
23. F. Riesz, "Geometrical optical model of the image formation in Makyoh (magic-mirror) topography", J. Phys. D: Appl. Phys. 33, 3033-3040, 2000.
24. D. L. Shealy and D. G. Burkhard, "Flux density for ray propagation in discrete index media expressed in terms of the intrinsic geometry of the deflecting surface ", Optica Acta 20, 287-301, 1973.
25. F. Riesz, "A quantitative approach to Makyoh (magic-mirror) topography", J. Crystal Growth 210, 370-374, 2000.
26. nd Ed., Pergamon Press, Oxford, 1964, p. 116 and 169.
27. 27. Ref. 26, p. 370.
28. 28. Ref. 26, p. 433.
29. rd Int. EuroConf. Advanced Semiconductor Devices and Microsystems, 16-18 Oct. 2000, Smolenice, Eds. J. Osvald, S. Haščík, J. Kuzmík and J. Breza, 215-218, IEEE, Piscataway, 2000.
30. K. H. Yang, "An optical imaging method for wafer warpage measurements", J. Electrochem. Soc. 132, 1214-1218, 1985.
31. B. C. Platt and R. Shack, "History and principles of Shack-Hartmann wavefront sensing", J. Refract. Surg. 17, S573-S577, 2001.
32. I. E. Lukács, Zs. Vízváry, P. Fürjes, F. Riesz, Cs. Dücsö and I. Bársony, "Determination of deformation induced by thin film residual stress in structures of millimetre size", Adv. Eng. Mater. 4, 625-627, 2002.
33. I. E. Lukács, F. Riesz and Z. J. Laczik, "High spatial resolution Makyoh topography using shifted grid illumination", Phys. Stat. Sol. A 195, 271-276, 2003.
34. F. Bitte, G. Dussler and T. Pfeifer, "3D microinspection goes DMD", Opt. Lasers. Engin. 36, 155-167, 2001.
35. J. Szabó, F. Riesz and B. Szentpáli, "Makyoh topography: curvature measurements and implications for the image formation", Japan. J. Appl. Phys. 35, L258-L261, 1996.
36. F. Riesz, "Camera length and field of view in Makyoh-topography instruments", Rev. Sci. Instrum. 72, 1591-1593, 2001.
37. th Intl. Conf. on Defects - Recognition, Imaging and Phys. in Semicond. (DRIP-X), 29 Sept. - 2 Oct. 2003, Batz-sur-Mer, France; Eur. Phys. J. - Appl. Phys., in press.
38. F. Riesz, "Makyoh topography for the morphological study of compound semiconductor wafers and structures", Mater. Sci. Eng. B, 80, 220-223, 2001.
39. C.-C. Shiue, K.-H. Lie and P. R. Blaustein, "Characterisation of deformations and texture defects on polished wafers of III-V compound crystals by the magic mirror method", Semicond. Sci. Technol. 7, A95-A97, 1992.
40. M. Németh-Sallay, G. M. Minchev, B. Pödör, L. D. Pramatarova, J. Szabó and B. Szentpáli, "Investigation of the surface preparation of GaAs substrates for MBE and VPE with whole sample optical reflection", J. Crystal Growth, 126, 70-76, 1993.
41. G. M. Minchev, L. D. Pramatarova, B. Podor and J. Szabo, "Experimental confirmation of the peculiar behavior of the coherent-type twin boundaries in sphalerite crystals", Crystal Res. Technol. 29, 1131-1137, 1994.
42. Z. Laczik, G. R. Booker and A. Mowbray, "Comparison of surface polishing techniques used for InP wafers", J. Crystal Growth, 153, 1-5, 1995.
43. Z. J. Pei and A. Strasbaugh, "Fine grinding of silicon wafers: designed experiments", Int. J. Machine Tools Manufact. 42, 395-404, 2002.
44. Z. J. Pei, X. J. Xin and W. Liu, "Finite element analysis for grinding of wire-sawn silicon wafers: a designed experiment", Int. J. Machine Tools Manufact. 43, 7-16, 2003.
45. I. E. Lukács and F. Riesz, "Makyoh-topography assessment of etch and polish removal of processed circuits for substrate re-use", Microel. Engin. 65, 380-386, 2003.
46. P. Möck, Z. J. Laczik and G. R. Booker, "Thermal processing induced plastic deformation in GaAs wafers", Mater. Sci. Eng. B 80, 91-94, 2001.
47. A. Nemcsics, F. Riesz, J. Szabó, Z. E. Horváth and S. Gurbán, "Makyoh-topography study of the curvature and surface morphology of mismatched InGaAs/GaAs heterostructures", Phys. Stat. Sol. A 177, 231-236, 2000.
48. F. Riesz and Z. R. Zytkiewicz, "The application of Makyoh topography for the study of GaAs layers grown by epitaxial lateral overgrowth", J. Crystal Growth, 222, 741-746, 2001.
49. th Micromechanics Europe Workshop, 6-8 Oct. 2002, Sinaia, Eds. D. Dascalu and A. Müller, 283-286, IMT, Bucharest, 2002.
50. F. Riesz, "Makyoh-topography assessment of the deformation of micromachined membrane structures on double-side coated substrates", Sensors Actuators A 102, 123-129, 2002.
51. F. Riesz, Cs. Dücsö, R. Konakova, A. E. Belyaev, E. A. Soloviev, N. S. Boltovets, A. Müller, F. Giacomozzi, I. Eördögh and B. Szentpáli, "The application of Makyoh (magic-mirror) topography for the study of deformations in dielectric membrane structures", Roman. J. Inf. Sci. Technol. 3,75-88, 2000.
52. F. Giacomozzi, V. Guarnieri, B. Margesin, A. Múller, M. Zen and F. Riesz, "Micromachined dielectric membranes for microwave applications", Roman. J. Inf. Sci. Technol. 3, 29-37, 2000.
53. K. Kugimiya, "Characterization of polished mirror surfaces by the Makyoh principle", Mater. Lett. 7, 229-233, 1988.
54. F. Riesz, L. D. Pramatarova, R. Pramatarova and A. L. Tóth, "Makyoh-topography studies of the morphology of the cross sections of renal stones", J. Crystal Growth 245, 101-108, 2002.