Determination of deformation induced by thin film residual stress in structures of millimeter size

Advanced Engineering Materials

Volumn 4, Issue 8, 2002, Pages 625-627

  Lukacs I E ^a   Vizvary Z ^b   Furjes P ^a   Riesz, F ^a   Ducso C ^a   Barsony I ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHEMICAL VAPOR DEPOSITION; DEFORMATION; EXTRACTION; FABRICATION; FINITE ELEMENT METHOD; RESIDUAL STRESSES; SILICON NITRIDE; SUBSTRATES;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

THIN FILMS;

EID: 0036672092     PISSN: 14381656     EISSN: None     Source Type: Journal    
DOI: 10.1002/1527-2648(20020806)4:8<625::AID-ADEM625>3.0.CO;2-E     Document Type: Conference Paper

References (9)