Surface-Processing-Enhanced Copper Diffusion into Fluorosilicate Glass

Journal of the Electrochemical Society

Volumn 148, Issue 11, 2001, Pages

  Tsui, Bing Yue ^a   Fang, Kuo Lung ^c   Lee, Shyh Dar ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0442277660     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1407249     Document Type: Article

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