Experimental evidence for nanoparticle deposition in continuous argon-silane plasmas: Effects of silicon nanoparticles on film properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 655-659

  Roca I Cabarrocas, Pere ^a   Gay, Patrick ^a   Hadjadj, Aomar ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ARGON; DEPOSITION; ELECTRIC DISCHARGES; ELLIPSOMETRY; LIGHT SCATTERING; PARTICLES (PARTICULATE MATTER); PLASMAS; POWDERS; SILANES; TRANSMISSION ELECTRON MICROSCOPY;

HYDROGENATED AMORPHOUS SILICON; IN SITU; NANOPARTICLE DEPOSITION; NANOPARTICLES;

NANOSTRUCTURED MATERIALS;

EID: 0001264634     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580162     Document Type: Article

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