Deposition, defect and weak bond formation processes in a-Si:H

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 32-36

  Robertson, J ^a   Powell, M J ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Deposition; Hydrogenated amorphous silicon; Weak bond formation

Indexed keywords

EID: 0002376331     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01171-7     Document Type: Article

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