Copper behavior in bulk silicon and associated characterization techniques

Journal of the Electrochemical Society

Volumn 150, Issue 12, 2003, Pages

  Heiser, T ^a   Belayachi, A ^a   Schunck, J P ^a  

^a UMR 7005   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL LATTICES; DIFFUSION; FERMI LEVEL; INTERFACES (MATERIALS); NUCLEATION; SILICON; SOLUBILITY; THERMAL EFFECTS;

COPPER IMPURITIES; COPPER TRACE DETECTION METHOD; OUT-DIFFUSION RATE;

COPPER;

EID: 0347020689     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1627351     Document Type: Article

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