Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: The detection of copper and nickel contamination by minority carrier lifetime methods

Materials Science and Engineering B

Volumn 36, Issue 1-3, 1996, Pages 85-90

  Bazzali, A ^a   Borionetti, G ^a   Orizio, R ^a   Gambaro, D ^a   Falster, R ^a  

^a MEMC Electronic Materials SpA   (Italy)

Author keywords

Copper; Nickel; Oxygen; Silicon

Indexed keywords

EID: 0002663657     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(95)01298-2     Document Type: Article

References (9)

1. R. Falster, in B.O. Kolbesen, P. Stallhofer, C. Claeys and F. Tartif (eds.), Proc. Satellite Symp. ESSDERC 93, Grenoble, France, 93 (15), The Electrochemical Society, Pennington, NJ, 1993, p. 149.
2. R. Falster and W. Bergholz, J. Electrochem. Soc., 137 (1990) 1548.
3. R. Falster, Z. Laczick, G.R. Booker, A.R. Bhatti and P. Torok, Mater. Res. Soc. Symp. Proc., 262 (1992) 945.
4. R.J. Falster, G.R. Fisher and G. Ferrero, Appl. Phys. Lett., 59 (1991) 809.
5. Z. Laczik, G.R. Booker, W. Bergholz and R. Falster, Appl. Phys. Lett., 55 (1989) 2625.
6. G.K. Fraundorf and R.A. Craven, in W.M. Bullis and S. Broydo (eds.), Proc. 3rd Int. Symp. on VLSI Science and Technology, The Electrochemical Society, Pennington, NJ, 1985, p. 436.
7. K. Graff, H.A. Hefner and H. Pieper, Mater. Res. Soc. Symp. Proc., 36 (1985) 19.
8. V. Lehmann and H. Foil, J. Electrochem. Soc., 135 (1988)2831.
9. R. Falster, D. Gambaro, M. Cornara, M. Olmo, K. Kelton and J. Binns, EMRS 1995 Spring Meeting.