SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 23-28

X-ray absorption spectroscopy on copper trace impurities on silicon wafers

(6) Singh, Andy a Baur, Katharina a Brennan, Sean a Homma, Takayuki b Kubo, Nobuhiro b Pianetta, Piero a

a SLAC NATIONAL ACCELERATOR LABORATORY (United States)

b WASEDA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CLEANING; COPPER; FLUORESCENCE; IMPURITIES; MONOLAYERS; OXIDATION; SURFACES; TRACE ANALYSIS; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER TRACE IMPURITIES; ULTRA PURE WATER; X RAY ABSORPTION NEAR EDGE SPECTROSCOPY; X RAY ABSORPTION SPECTROSCOPY;

SILICON WAFERS;

EID: 0036945613 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-716-b1.4 Document Type: Conference Paper

Times cited : (9)

References (10)

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