Pack-extraction method combined with inductively coupled plasma mass spectroscopy to monitor metal contaminants on surfaces of silicon wafers

Semiconductor Science and Technology

Volumn 15, Issue 7, 2000, Pages 776-781

  Shimizu, Hirofumi ^a   Ishiwari, Shuichi ^b  

^a NIHON UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COPPER; CRYSTAL IMPURITIES; INORGANIC ACIDS; IRON; MASS SPECTROMETRY; NICKEL; OXIDES; PLASMA APPLICATIONS; SURFACE PROPERTIES; ZINC;

PACK-EXTRACTION METHOD (PEM); PLASMA MASS SPECTROSCOPY;

SILICON WAFERS;

EID: 0034227746     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/7/320     Document Type: Article

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