Confined capillary stresses during the initial growth of thin films on amorphous substrates

Journal of Applied Mechanics, Transactions ASME

Volumn 69, Issue 4, 2002, Pages 425-432

  Gill, S P A ^a   Gao, H ^a   Ramaswamy, V ^a   Nix, W D ^a  

^a UNIVERSITY OF LEICESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COMPRESSIVE STRESS; COMPUTER SIMULATION; FILM GROWTH; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; STRAIN; SUBSTRATES;

CAPILLARY STRESSES;

THIN FILMS;

EID: 0036661024     PISSN: 00218936     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.1469001     Document Type: Article

References (7)

1. Phillips, M.A., Ramaswamy, V., Clemens, B.M., and Nix, W.D., 2002, "Stress and Microstructure Evolution During Initial Growth of Pt on Amorphous Substrates," J. Mater. Res., accepted for publication.
2. Nix, W.D., and Clemens, B.M., 1999, "Crystallite Coalescence: A Mechanism for Intrinsic Tensile Stresses in Thin Films," J. Mater. Res., 14, p. 3467.
3. 2 and SiO Substrates," Thin Solid Films, 52, p. 215.
4. Abermann, R., and Koch, R., 1979, "Internal Stress on Thin Silver and Gold Films and Its Dependence on Gas Absorption," Thin Solid Films, 62, p. 195.
5. 2 Pressure During Deposition," Thin Solid Films, 66, p. 217.
6. Cammarata, R.C., and Sieradzki, K., 1994, "Surface and Interface Stresses," Annu. Rev. Mater. Sci., 24, p. 215.
7. Timoshenko, S.P., and Goodier, J.N., 1970, Theory of Elasticity, McGraw-Hill, New York, pp. 392-395.