Void formation during film growth: A molecular dynamics simulation study

Journal of Applied Physics

Volumn 79, Issue 3, 1996, Pages 1448-1457

  Smith, Richard W ^a   Srolovitz, David J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000227558     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360983     Document Type: Article

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