Mo/Si-multilayers for EUV applications prepared by pulsed laser deposition (PLD)

Microelectronic Engineering

Volumn 57, Issue 58, 2001, Pages 9-15

  Braun, S T ^a   Dietsch, R ^a   Haidl, M ^b   Holz, T H ^a   Mai, H ^a   Mullender S ^b   Scholz, R ^c  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; LASER ABLATION; MIRRORS; PULSED LASER DEPOSITION; REFLECTOMETERS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS; X RAY OPTICS;

EXTREME ULTRAVIOLET LOTHOGRAPHY (EUVL);

MULTILAYERS;

EID: 0035450910     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00425-7     Document Type: Article

References (6)