Environmental data from the engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 310-315

  Klebanoff, L E ^a   Grunow, P A ^a   Graham, S ^a   Clift, W M ^a   Leung, A H ^a   Haney, S J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Cleaning; Contamination; ETS; EUV; Lithography; Optics

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; LIGHT REFLECTION; MULTILAYERS; PHOTOLITHOGRAPHY; RADIATION DAMAGE;

MULTILAYER RADIATION DAMAGE;

ULTRAVIOLET RADIATION;

EID: 0036378692     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472304     Document Type: Conference Paper

References (6)

1. D.A. Tichenor, G.D. Kubiak, W.C. Replogle, L.E. Klebanoff, J.B. Wronosky, L.C. Hale, H.N. Chapman, J.S. Taylor, J.A. Folta, C. Montcalm, R.M. Hudyma, K.A. Goldberg, and P. Nalleau, Proceedings of SPIE 3997, 48 (2000).
2. L.E. Klebanoff, M.E. Malinowski, P. Grunow, W.M. Clift, C. Steinhaus, A.H. Leung, S.J. Harley, Proc. SPIE, 4343, 342 (2001)
3. D. Attwood, "Soft X-Rays and Extreme Ultra Violet Radiation" (Cambridge U. press, New York, (2000) p.404.
4. L.E. Klebanoff, M.E. Malinowski, W.M. Clift, C. Steinhaus, and P. Grunow, to be submitted to JVST.
5. Regina Soufli, private communication
6. S. Bajt, J. Alameda, T. Barbee Jr., W.M. Clift, J.A. Folta, B. Kaufmann, and E. Spiller, Proc. of SPIE, 4506, 65 (2001).