High-performance Mo–Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

Applied Optics

Volumn 42, Issue 19, 2003, Pages 4049-4058

  Spiller, Eberhard ^a   Baker, Sherry L ^a   Mirkarimi, Paul B ^a   Sperry, Victor ^a   Gullikson, Eric M ^b   Stearns, Daniel G ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c OS Associates   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; ION BEAM ASSISTED DEPOSITION; ION BEAM LITHOGRAPHY; MOLYBDENUM; MULTILAYERS; SUBSTRATES;

PROFILE CONTROL;

OPTICAL COATINGS;

EID: 0042810711     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.004049     Document Type: Article

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