First environmental data from the EUV Engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 342-346

  Klebanoff, L E ^a   Malinowski, M E ^a   Grunow, P ^a   Clift, W M ^a   Steinhaus, C ^a   Leung, A H ^a   Haney, S J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Contamination; EUV; Lithography; Oxidation

Indexed keywords

CRACKING (CHEMICAL); DEGASSING; HYDROCARBONS; IRRADIATION; OXIDATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034768869     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436676     Document Type: Conference Paper

References (5)