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Volumn 13, Issue 18, 2001, Pages 3969-3976

Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering: The influence of self-bias voltage on reflectivity and roughness

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MAGNETRON SPUTTERING; OPTICAL MULTILAYERS; REFLECTION; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EID: 0035821029     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/13/18/307     Document Type: Article
Times cited : (10)

References (21)
  • 17
    • 0004923816 scopus 로고
    • PhD Thesis Université de Paris-Sud, Orsay
    • (1978)
    • Névot, L.1
  • 21
    • 0004940099 scopus 로고    scopus 로고
    • Comparison of interfacial roughness propagation and correlation in Mo/Si multilayers deposited using ion beam sputtering and RF-magnetron sputtering
    • in preparation
    • (2001)
    • Putero-Vuaroqueaux, M.1    Vidal, B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.