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Volumn 13, Issue 18, 2001, Pages 3969-3976
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Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering: The influence of self-bias voltage on reflectivity and roughness
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Author keywords
[No Author keywords available]
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Indexed keywords
LITHOGRAPHY;
MAGNETRON SPUTTERING;
OPTICAL MULTILAYERS;
REFLECTION;
SURFACE ROUGHNESS;
ULTRAVIOLET RADIATION;
EXTREME ULTRAVIOLET LITHOGRAPHY;
EXTREME ULTRAVIOLET MULTILAYER MIRRORS;
RADIO FREQUENCY MAGNETRON SPUTTERING;
SELF BIAS VOLTAGE;
MIRRORS;
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EID: 0035821029
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/13/18/307 Document Type: Article |
Times cited : (10)
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References (21)
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