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Volumn 67, Issue 23, 2003, Pages

Nanovoids in MBE-grown SiGe alloys implanted in situ with Ge+ ions

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY; ARSENIC; GERMANIUM; SILICON;

EID: 0043167771     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.67.235310     Document Type: Article
Times cited : (19)

References (45)
  • 1
    • 85039008493 scopus 로고    scopus 로고
    • R. W. Collins, F. M. Fauchet, I. Shimizu, J. C. Vital, T. Shimada, and A. P. Alivisators, MRS Symposia Proceedings, Mater. Res. Soc. Symp. No. 452Materials Research Society, Pittsburgh
    • Advances in Microcrystalline and Nonocrystalline Semiconductor, edited by R. W. Collins, F. M. Fauchet, I. Shimizu, J. C. Vital, T. Shimada, and A. P. Alivisators, MRS Symposia Proceedings, Mater. Res. Soc. Symp. No. 452 (Materials Research Society, Pittsburgh, 1997).
    • (1997) Advances in Microcrystalline and Nonocrystalline Semiconductor
  • 41
    • 0004200984 scopus 로고
    • S. T. PantelidesGordon and Breach, New York
    • G. D. Watkins, in Deep Centers in Semiconductors, edited by S. T. Pantelides (Gordon and Breach, New York, 1986), p. 147.
    • (1986) Deep Centers in Semiconductors , pp. 147
    • Watkins, G.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.