-
1
-
-
29044450067
-
-
Oct.
-
M. Switkes, M. Rothschild, J. Microlithography, Microfabrication and Microsystems, Vol. 1, No. 3, p. 225, Oct. 2002.
-
(2002)
J. Microlithography, Microfabrication and Microsystems
, vol.1
, Issue.3
, pp. 225
-
-
Switkes, M.1
Rothschild, M.2
-
2
-
-
0013460855
-
Big challenges confront EUV commercialization push
-
Oct. 15
-
D. Lammers, "Big Challenges Confront EUV Commercialization Push," Semiconductor Business News, Oct. 15, 2002.
-
(2002)
Semiconductor Business News
-
-
Lammers, D.1
-
3
-
-
0013415352
-
Is IC industry heading to the $10 million photomask?
-
Oct. 7
-
M. LaPedus, "Is IC Industry Heading to the $10 Million Photomask?" Semiconductor Business News, Oct. 7, 2002.
-
(2002)
Semiconductor Business News
-
-
Lapedus, M.1
-
4
-
-
0036030773
-
-
L. Liebmann et al., SPIE, Vol. 4692, p. 262, 2002.
-
(2002)
SPIE
, vol.4692
, pp. 262
-
-
Liebmann, L.1
-
5
-
-
0035449386
-
Optimal insertion points for OPC and PSM in design flows
-
Sept.
-
F. Schellenberg, "Optimal Insertion Points for OPC and PSM in Design Flows," Solid State Technology, Sept. 2001.
-
(2001)
Solid State Technology
-
-
Schellenberg, F.1
-
6
-
-
0002986808
-
-
J.S. Petersen, SPIE, Vol. 4000, p. 77, 2000.
-
(2000)
SPIE
, vol.4000
, pp. 77
-
-
Petersen, J.S.1
-
7
-
-
0003973518
-
Resolution enhancement techniques in optical lithography
-
SPIE Press
-
A.K. Wong, "Resolution Enhancement Techniques in Optical Lithography," SPIE Press, pp. 101-105, 2001.
-
(2001)
, pp. 101-105
-
-
Wong, A.K.1
-
8
-
-
0033319819
-
-
C. Constantine, R. Westerman, J. Plumhoff, SPIE, Vol. 3873, p. 93, 1999.
-
(1999)
J. Plumhoff, SPIE
, vol.3873
, pp. 93
-
-
Constantine, C.1
Westerman, R.2
-
9
-
-
0035772860
-
-
M. Rieger, J.P. Mayhew, J. Li, J.P. Shiely, SPIE, Vol. 4562, p. 154, 2001.
-
(2001)
SPIE
, vol.4562
, pp. 154
-
-
Rieger, M.1
Mayhew, J.P.2
Li, J.3
Shiely, J.P.4
-
10
-
-
0036416660
-
-
J.A. Torres, F.M. Schellenberg, O. Toublan, SPIE, Vol. 4691, p. 407, 2002.
-
(2002)
SPIE
, vol.4691
, pp. 407
-
-
Torres, J.A.1
Schellenberg, F.M.2
Toublan, O.3
-
11
-
-
0035758402
-
-
A.E. Rosenbluth, et al., SPIE, Vol. 4346, p. 486, 2001.
-
(2001)
SPIE
, vol.4346
, pp. 486
-
-
Rosenbluth, A.E.1
-
12
-
-
0003973518
-
Resolution enhancement techniques in optical lithography
-
SPIE Press
-
A.K. Wong, "Resolution Enhancement Techniques in Optical Lithography," SPIE Press, p. 80, 2001.
-
(2001)
, pp. 80
-
-
Wong, A.K.1
-
13
-
-
0020249292
-
-
Dec.
-
M.D. Levenson, N.S. Viswanathan, R.A. Simpson, IEEE Trans. Elec. Dev., Vol. ED-29 No. 12, p. 1828, Dec. 1982.
-
(1982)
IEEE Trans. Elec. Dev.
, vol.ED-29
, Issue.12
, pp. 1828
-
-
Levenson, M.D.1
Viswanathan, N.S.2
Simpson, R.A.3
-
15
-
-
0003973518
-
Resolution enhancement techniques in optical lithography
-
SPIE Press
-
A.K. Wong, "Resolution Enhancement Techniques in Optical Lithography," SPIE Press, p. 123, 2001.
-
(2001)
, pp. 123
-
-
Wong, A.K.1
-
16
-
-
0035047045
-
-
M.D. Levenson, J.S. Petersen, D. Gerold, C.A. Mack, SPIE, Vol. 4186, p. 395, 2001.
-
(2001)
SPIE
, vol.4186
, pp. 395
-
-
Levenson, M.D.1
Petersen, J.S.2
Gerold, D.3
Mack, C.A.4
-
17
-
-
0005213734
-
-
H.Y. Liu, L. Karklin, Y.T. Wang, Y.C. Pati, SPIE, Vol. 3334, p. 2, 1998.
-
(1998)
SPIE
, vol.3334
, pp. 2
-
-
Liu, H.Y.1
Karklin, L.2
Wang, Y.T.3
Pati, Y.C.4
-
18
-
-
0013450704
-
Semicon's 'sunday panel' predicts litho market split
-
July 22
-
P. Clarke, "Semicon's 'Sunday Panel' Predicts Litho Market Split," Semiconductor Business News, July 22, 2002.
-
(2002)
Semiconductor Business News
-
-
Clarke, P.1
-
19
-
-
0013365911
-
The photomask industry: Minimizing a crisis in escalating costs
-
Aug.
-
R. Castellano, "The Photomask Industry: Minimizing a Crisis in Escalating Costs," Solid State Technology, Aug. 2002.
-
(2002)
Solid State Technology
-
-
Castellano, R.1
-
20
-
-
0242550232
-
ASICs in decline as OEM's grope for less-costly options
-
Nov. 4
-
R. Merritt, "ASICs in Decline as OEM's Grope for Less-costly Options," EE Times, issue 1243, p. 1, Nov. 4, 2002.
-
(2002)
EE Times
, Issue.1243
, pp. 1
-
-
Merritt, R.1
-
21
-
-
0035759009
-
-
J. Park et al., SPIE, Vol. 4346, p. 205, 2001.
-
(2001)
SPIE
, vol.4346
, pp. 205
-
-
Park, J.1
-
22
-
-
0012427320
-
-
M. Fritze et al., SPIE, Vol. 4000, p. 388, 2000.
-
(2000)
SPIE
, vol.4000
, pp. 388
-
-
Fritze, M.1
-
23
-
-
0033713398
-
-
M. Plat, K. Nguyen, C. Spence, C. Lyons, A. Wilkison, SPIE, Vol. 4000, p. 206, 2000.
-
(2000)
SPIE
, vol.4000
, pp. 206
-
-
Plat, M.1
Nguyen, K.2
Spence, C.3
Lyons, C.4
Wilkison, A.5
-
24
-
-
0036412671
-
-
C. Pierrat, M. Cote, K. Patterson, SPIE, Vol. 4691, p. 325, 2002.
-
(2002)
SPIE
, vol.4691
, pp. 325
-
-
Pierrat, C.1
Cote, M.2
Patterson, K.3
-
25
-
-
0013457238
-
-
Oct.
-
D.J. Van Den Broeke et al., J. Microlithography, Microfabrication and Microsystems, Vol. 1, No. 3, p. 229, Oct. 2002.
-
(2002)
J. Microlithography, Microfabrication and Microsystems
, vol.1
, Issue.3
, pp. 229
-
-
Van Den Broeke, D.J.1
-
26
-
-
0032632137
-
-
A. Suzuki, K. Saitoh, M. Yoshii, SPIE, Vol. 3679, p. 396, 1999.
-
(1999)
SPIE
, vol.3679
, pp. 396
-
-
Suzuki, A.1
Saitoh, K.2
Yoshii, M.3
-
27
-
-
0013457134
-
-
Oct.
-
B. Tyrrell et al., J. Microlithography, Microfabrication and Microsystems, Vol. 1, No. 3, p. 243, Oct. 2002.
-
(2002)
J. Microlithography, Microfabrication and Microsystems
, vol.1
, Issue.3
, pp. 243
-
-
Tyrrell, B.1
-
28
-
-
0034316880
-
-
Nov./Dec.
-
M. Fritze et al., JVST B, 18, 6, p. 2886, Nov./Dec. 2000.
-
(2000)
JVST B
, vol.18
, Issue.6
, pp. 2886
-
-
Fritze, M.1
-
29
-
-
0012659210
-
-
Nov./Dec.
-
M. Fritze, B. Tyrrell, et al., JVST B, 19, 6, p. 2366, Nov./Dec. 2001.
-
(2001)
JVST B
, vol.19
, Issue.6
, pp. 2366
-
-
Fritze, M.1
Tyrrell, B.2
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