MEEF in theory and practice

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 189-202

  Schellenberg, F M ^a   Mack, Chris ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE EXTRACTION; FUNCTIONS; IMAGING SYSTEMS; INSTRUMENT ERRORS; INSTRUMENT SCALES; NUMERICAL METHODS; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY;

MASK ERROR ENHANCEMENT FUNCTION; OPTICAL AND PROCESS CORRECTION; OPTICAL PROXIMITY CORRECTION; RETICLE;

MASKS;

EID: 0033315960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373313     Document Type: Conference Paper

References (13)