Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2366-2370

  Fritze, M ^a   Tyrrell, B ^a   Astolfi, D ^a   Yost, D ^a   Davis, P ^a   Wheeler, B ^a   Mallen, R ^a   Jarmolowicz, J ^a   Cann, S ^a   Chan, D ^b   Rhyins, P ^b   Carney, C ^c   Ferri, J ^c   Blachowicz, B A ^c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b PHOTRONICS INC   (United States)

^c Arch Chemicals Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; IMAGE ANALYSIS; IMAGE ENHANCEMENT; IMAGING TECHNIQUES; SCANNING ELECTRON MICROSCOPY; ULSI CIRCUITS;

OPTICAL PROXIMITY CORRECTIONS; OPTICAL PROXIMITY EFFECTS; OPTICAL RESOLUTION-ENHANCEMENT TECHNOLOGY; PHASE SHIFT LITHOGRAPHY; REGULAR ARRAYS;

PHOTOLITHOGRAPHY;

EID: 0012659210     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1408950     Document Type: Article

References (13)

1. A. B. Kahng and Y. C. Pati, Design Automation Conference (DAC) Proceedings, 1999, p. 799.
2. Handbook of Microlithography, Micromachining and Microfabrication, edited by P. RaiChoudhury (SPIE, Bellingham, WA, 1997), Chap. 1.
3. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, IEEE Trans. Electron Devices ED-29, 1828 (1982).
4. M. Fritze et al., J. Vac. Sci. Technol. B 18, 2886 (2000).
5. O. Toublan, E. Sahouria, N. Cobb, T. Do, T. Donnelly, Y. Granik, F. Schellenberg, and P. Schiavone, Proc. SPIE 4000, 160 (2000).
6. H. Y. Liu, L. Karklin, Y. T. Wang, and Y. C. Pati, Proc. SPIE 3334, 2 (1998).
7. C. M. Wang, C. W. Lai, J. Huang, and H. Y. Liu, Proc. SPIE 4346, 452 (2001).
8. A. Suzuki, K. Saitoh, and M. Yoshii, Proc. SPIE 3679, 396 (1999).
9. M. D. Levenson, J. S. Petersen, D. G. Gerold, and C. A. Mack, Proc. SPIE 4186, 395 (2000).
10. M. Fritze et al., Proc. SPIE 4346, 191 (2001).
11. ITRS Roadmap, www.itrs.net
12. S. Nakao, A. Nakae, A. Yamaguchi, H. Kimura, and Y. Ohno, Tech. Dig. Int. Electron Devices Meet. 61 (1996).
13. M. Fritze et al., J. Vac. Sci. Technol. B 17, 3310 (1999).