Investigation of the physical and practical limits of dense-only phase shift lithography for circuit feature definition

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 3, 2002, Pages 243-252

  Tyrrell, Brian ^a   Fritze, Michael ^a   Astolfi, David ^a   Mallen, Renée ^a   Wheeler, Bruce ^a   Rhyins, Peter ^b   Martin, Patrick ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b PHOTRONICS INC   (United States)

Author keywords

ASIC; CD control; Design reuse; Double exposure resolution enhancement techniques; Lithography; Low K1; Optical lithography; Optical proximity correction; Phase shift lithography; Subwavelength imaging

Indexed keywords

EID: 0013457134     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1503349     Document Type: Article

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