Impact of optical enhancement techniques on the mask error enhancement function (MEEF)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 206-214

  Plat, Marina ^a   Nguyen, Khanh ^a   Spence, Chris ^a   Lyons, Chris ^a   Wilkison, Amada ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LOGIC GATES; MASKS;

MASK ERROR ENHANCEMENT FACTOR (MEEF); PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033713398     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389009     Document Type: Conference Paper

References (6)