New alternating phase-shifting mask conversion methodology using phase conflict resolution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 325-335

  Pierrat, Christophe ^a   Côté, Michel ^a   Patterson, Kyle ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Data conversion; Double exposure; OPC; Phase conflict; Phase shifting mask; PSM; RET; Standard cell

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; MASKS; PHASE SHIFT; PROJECTION SYSTEMS;

PHASE CONFLICT;

PHOTOLITHOGRAPHY;

EID: 0036412671     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474582     Document Type: Article

References (4)

1. C.M. Wang et al., SPIE vol. 4346, pp. 452-463, 2001.
2. 3, pp. 31-42, April 2002.
3. C. Pierrat, SPIE vol. 4186, pp. 325-335, 2000.
4. C. Pierrat et al., IEDM 1992, pp 3.3.1-3.3.4.