Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 93-97

  Constantine, C ^a   Westerman, R ^a   Plumhoff, J ^a  

^a Qualtx Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHROMIUM; DRY ETCHING; GATES (TRANSISTOR); INTEGRATED CIRCUIT LAYOUT; LITHOGRAPHY; PLASMA ETCHING;

GATE LEVEL DESIGNS; PATTERN LOADING; PATTERN TRANSFER; PHOTOMASKS;

MASKS;

EID: 0033319819     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373288     Document Type: Conference Paper

References (6)