SCOPUS 정보 검색 플랫폼

Volumn 44, Issue 9, 2001, Pages

Optimal insertion points for OPC and PSM in design flows

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONICS INDUSTRY; GEOMETRY; INTEGRATED CIRCUITS; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

OPTICAL PROXIMITY CORRECTION; PHASE SHIFT MASKS; RESOLUTION ENHANCEMENT TECHNOLOGIES;

MASKS;

EID: 0035449386 PISSN: 0038111X EISSN: None Source Type: Trade Journal
DOI: None Document Type: Article

Times cited : (3)

References (5)

1
- 0020249292
- Improving resolution in lithography with a phase-shifting mask
- (1982) IEEE Trans. Electron Devices , vol.29 ED , pp. 1828-1836
- Levenson, M.D.¹ Viswanathan, N.S.² Simpson, R.A.³

2
- 0019612832
- Reduction of errors of microphotographic reproductions by optimal corrections of original masks
- (1981) Opt. Eng. , vol.20 , pp. 781
- Saleh, B.E.A.¹ Sayegh, S.²

3
- 0032715238
- Design for manufacturing in the semiconductor industry: The litho/design workshops
- ed. R. Sipple, IEEE Computer Society Press, Los Alamitos, CA
- (1999) Proceedings of the 12th International Conference on VLSI Design , pp. 111-119
- Schellenberg, F.M.¹

4
- 0032657931
- Implementation issues for production OPC
- in Photomask and X-Ray Mask Technology VI, ed. H. Morimoto
- (1999) Proc SPIE , pp. 249-258
- Schellenberg, F.M.¹ LaCour, P.²

5
- 0033310414
- Integration of optical proximity correction strategies in strong phase shifter design for poly-gate layer
- ed. F. Abboud, B. Grenon, Proc. SPIE 3873
- (1999) 19th Annual Symposium on Photomask Technology , pp. 277-287
- Spence, C.¹ Plat, M.² Sahouria, E.³ Cobb, N.⁴ Schellenberg, F.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.