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Volumn 248, Issue SUPPL., 2003, Pages 479-486

Metalorganic chemical vapor deposition of group III nitrides - A discussion of critical issues

Author keywords

A1. Doping; A1. Segregation; A1. Surface processes; A1. Surface structure; A3. Metalorganic chemical vapor deposition; B1. Nitrides

Indexed keywords

METALLORGANIC VAPOR PHASE EPITAXY; OPTOELECTRONIC DEVICES; SEMICONDUCTOR DOPING; SURFACE STRUCTURE;

EID: 0037292445     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01867-5     Document Type: Conference Paper
Times cited : (82)

References (62)
  • 7
    • 0012134722 scopus 로고    scopus 로고
    • Y.-F. Wu, D. Kapolnek, J.P. Ibbetson, P. Parikh, B.P. Keller, U.K. Mishra, 2000 IEEE MTT-S International Microwave Symposium Digest (Cat. No.00CH37017), Boston, MA, USA, June 2000, Piscataway, NJ, USA; IEEE (2000) 963.
    • (2000) IEEE , pp. 963


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.