Role of O(1D) in the oxidation of Si(100)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 895-899

  Kaspar, Tiffany ^a,b   Tuan, Allan ^a,b   Tonkyn, Russell ^b   Hess, Wayne P ^b   Rogers Jr , J W ^b   Ono, Yoshi ^c  

^a University of Washington   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GROUND STATE; OXIDATION; OXIDES; OXYGEN; PHOTODISSOCIATION; PLASMAS;

THICKER OXIDES;

SILICON;

EID: 0037277703     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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