Ultrathin oxide film formation using radical oxygen in an ultrahigh vacuum system

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 9 A/B, 1999, Pages

  Watanabe, Koji ^a   Kimura, Shigeru ^a   Tatsumi, Toru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; INTERFACES (MATERIALS); OXIDATION; OXIDES; OXYGEN; REFLECTOMETERS; SURFACE ROUGHNESS; VACUUM;

GRAZING-INCIDENCE X RAY REFLECTOMETRY; ULTRAHIGH VACUUM SYSTEMS; ULTRATHIN OXIDE FILMS;

ULTRATHIN FILMS;

EID: 0033348107     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1055     Document Type: Article

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