Moore's law lives on

IEEE Circuits and Devices Magazine

Volumn 19, Issue 1, 2003, Pages 35-42

  Chang, Leland ^a   Choi, Yang Kyu ^a   Kedzierski, Jakub ^b   Lindert, Nick ^c   Xuan, Peiqi ^a   Bokor, Jeffrey ^a   Hu, Chenming ^a   King, Tsu Jae ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; DIGITAL INTEGRATED CIRCUITS; LEAKAGE CURRENTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY; THRESHOLD VOLTAGE; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

DRIVE CURRENT; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; SHORT CHANNEL EFFECTS; SOLID PHASE EPITAXY;

MOSFET DEVICES;

EID: 0037232894     PISSN: 87553996     EISSN: None     Source Type: Journal    
DOI: 10.1109/MCD.2003.1175106     Document Type: Article

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