On the surface roughness evolution during a-Si:H growth

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 3-13

  Van De Sanden, M C M ^a   Smets, A H M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; FILM GROWTH; HYDROGEN; SURFACE ROUGHNESS; TEMPERATURE;

SURFACE DIFFUSION; UNIVERSALITY CLASSES;

AMORPHOUS SILICON;

EID: 0036919193     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a15.1     Document Type: Conference Paper

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