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Volumn 57, Issue 4, 1998, Pages 2253-2256

Mechanism for hydrogen diffusion in amorphous silicon

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Indexed keywords


EID: 0001401004     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.57.2253     Document Type: Article
Times cited : (49)

References (15)
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    • Qiming Li and R. Biswas, Phys. Rev. B 52, 10 705 (1995).
    • (1995) Phys. Rev. B , vol.52 , pp. 10705
    • Biswas, R.1
  • 8
    • 35949007603 scopus 로고
    • Qiming Li and R. Biswas, Phys. Rev. B 50, 18 090 (1994).
    • (1994) Phys. Rev. B , vol.50 , pp. 18090
    • Biswas, R.1
  • 9
    • 0000862148 scopus 로고    scopus 로고
    • W. Beyer and U. Jastrow, in Amorphous Silicon Technology—1996, edited by M. Hack, E. A. Schiff, S. Wagner, A. Matsuda, and R. Schropp, MRS Symposia Proceedings No. 420 (Materials Research Society, Pittsburgh, 1996) p. 497.
    • (1996) Amorphous Silicon Technology—1996 , pp. 497
    • Beyer, W.1    Jastrow, U.2
  • 14
    • 0642263647 scopus 로고
    • P. Hari, P. C. Taylor, and R. A. Street, in Amorphous Silicon Technology—1994, edited by E. A. Schiff, M. Hack, A. Madon, M. Powell, and A. Matsuda, MRS Symposia Proceedings No. 336 (Materials Research Society, Pittsburgh, 1994), p. 329.
    • (1994) Amorphous Silicon Technology—1994 , pp. 329
    • Hari, P.1    Taylor, P.2    Street, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.