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Volumn 11, Issue 8, 2002, Pages 1584-1591

Influences of substrate bias on the composition and structure of carbon nitride thin films prepared by ECR-plasma assisted pulsed laser deposition

(9) Ling, H a Wu, J D a Sun, J a Shi, W a Ying, Z F a Xu, N a Pan, W J a Ding, X M b Zhou, Z Y a

a FUDAN UNIVERSITY (China)

b Surface Physics Laboratory National Key Laboratory (China)

Author keywords

Bias; Ion bombardment; Nitrides; Plasma assisted pulsed laser deposition

Indexed keywords

BONDING; COMPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; SURFACE REACTIONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE THIN FILMS;

CARBON NITRIDE;

CARBON; CARBON NITRIDE; NITROGEN;

DIAMOND;

BINDING KINETICS; CHEMICAL COMPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM; GAS FLOW; INFRARED SPECTROSCOPY; LOW TEMPERATURE; PLASMA (IONIZED GAS); PLASMA ASSISTED PULSED LASER DEPOSITION; RAMAN SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036647082 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(02)00101-2 Document Type: Article

Times cited : (14)

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