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Applied Physics A: Materials Science and Processing

Volumn 73, Issue 5, 2001, Pages 605-608

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

(8) Shi, W a Wu, J D a Sun, J a Ling, H a Ying, Z F a Ding, X M a Zhou, Z Y a Li, F M a

a FUDAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CARBON NITRIDE; CHEMICAL BONDS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MICROWAVE DISCHARGE;

THIN FILMS;

EID: 0035500660 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100806 Document Type: Article

Times cited : (10)

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