The effect of substrate temperature on the growth of CNx films with β-C3N4-like microcrystallites by an inductively coupled plasma (ICP) sputtering method

Diamond and Related Materials

Volumn 8, Issue 7, 1999, Pages 1315-1323

  Hsu, Chia Yuan ^a   Hong, Frankin Chau Nan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

C3N4 crystallites; Carbon nitride; Inductively coupled plasma; Sputtering; Thin film deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; FILM GROWTH; NITRIDES; PLASMA APPLICATIONS; SPUTTERING; SUBSTRATES; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; INDUCTIVELY COUPLED PLASMA; TRANSMISSION ELECTRON DIFFRACTION;

CRYSTAL GROWTH;

EID: 0033165187     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00130-2     Document Type: Article

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