Electron imaging of dielectrics under simultaneous electron-ion irradiation

Journal of Applied Physics

Volumn 91, Issue 7, 2002, Pages 4479-4491

  Toth, M ^a   Phillips, M R ^b   Thiel, B L ^a   Donald, A M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF TECHNOLOGY SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CONTRAST MECHANISM; ELECTRON IMAGING; ELECTRON IONS; EMISSION PROCESS; EMITTED ELECTRON; ION FLUXES; LATERAL VARIATIONS; MICROSCOPIC VARIATION; RECOMBINATION RATE; SAMPLE SURFACE; SECONDARY ELECTRON IMAGES; SOFT-LANDING; TRAPPED CHARGE;

DIELECTRIC PROPERTIES;

IONS;

EID: 0036536865     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448875     Document Type: Article

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