Threshold energy effects in secondary electron emission

Microscopy and Microanalysis

Volumn 6, Issue 4, 2000, Pages 291-296

  Howie, A ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Doping contrast; Environmental scanning electron microscopy; Escape depth; Inelastic scattering mean free path; Ionization damage; Photoelectron emission microscopy

Indexed keywords

EID: 0039594718     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/S1431927602000521     Document Type: Article

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