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Journal of Physics D: Applied Physics

Volumn 34, Issue 5, 2001, Pages 690-699

Effects of the substrate temperature on the growth and properties of hydrogenated nanostructured silicon thin films

(6) Hadjadj, A a Beorchia, A a Roca I Cabarrocas, P b Boufendi, L c Huet, S c Bubendorff, J L d

a CNRS (France)

b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

c UNIVERSITÉ D'ORLÉANS (France)

d UNIVERSITÉ DE REIMS CHAMPAGNE ARDENNE (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; FILM GROWTH; HYDROGENATION; MATRIX ALGEBRA; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS;

HYDROGENATED NANOSTRUCTURED SILICON THIN FILMS;

AMORPHOUS FILMS;

EID: 0035819781 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/5/305 Document Type: Article

Times cited : (28)

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