Deposition of nanostructured silicon thin films by means of the selective contribution of particles in PECVD

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 499-504

  Costa, J ^a   Roura, P ^a   Roca i Cabarrocas, P ^a   Viera, G ^a   Bertran, E ^a  

^a UNIVERSITY OF GIRONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; COAGULATION; CRYSTAL GROWTH; FILM GROWTH; NANOSTRUCTURED MATERIALS; NUCLEATION; PARTICLE SIZE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0032675564     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)