Nanostructured silicon thin films deposited by PECVD in the presence of silicon nanoparticles

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 313-318

  Viera, G ^a   i Cabarrocas, P Roca ^a   Hamma, S ^a   Sharma, S N ^a   Costa, J ^a   Bertran, E ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; FILM GROWTH; NANOSTRUCTURED MATERIALS; PARTICLES (PARTICULATE MATTER); PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ELECTRIC CHARACTERIZATION; ORDERED SILICON DOMAIN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NANOPARTICLES;

THIN FILMS;

EID: 0031353444     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-313     Document Type: Conference Paper

References (18)