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Volumn 11, Issue 1, 1998, Pages 147-148
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A novel low molecular-weight organic resist with high sensitivity for nanometer lithography
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Author keywords
1,3,5 tris 4 (4 vinylphenylcarbonyloxy)phenyl benzene; Amorphous molecular material; Molecular resist; Negative electron beam resist; Resolution; Sensitivity
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Indexed keywords
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EID: 0000570055
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.11.147 Document Type: Article |
Times cited : (14)
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References (3)
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