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Volumn 11, Issue 1, 1998, Pages 147-148

A novel low molecular-weight organic resist with high sensitivity for nanometer lithography

Author keywords

1,3,5 tris 4 (4 vinylphenylcarbonyloxy)phenyl benzene; Amorphous molecular material; Molecular resist; Negative electron beam resist; Resolution; Sensitivity

Indexed keywords


EID: 0000570055     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.147     Document Type: Article
Times cited : (14)

References (3)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.