Patterning of hyperbranched resist materials by electron-beam lithography

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Volumn 41, Issue 1, 2000, Pages 325-326

  Trimble, Alexander R ^a   Tully, David C ^a   Fréchet, Jean M J ^a   Medeiros, David R ^b   Angelopoulos, Marie ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CARBONATES; ELECTRON BEAM LITHOGRAPHY; MOLECULAR STRUCTURE; POLYESTERS;

CHEMICALLY AMPLIFIED RESISTS; HYPERBRANCHED POLYMERS;

AROMATIC POLYMERS;

EID: 0033751183     PISSN: 00323934     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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