A new photoresist based on poly(propyleneimine) dendrimer

Journal of Photopolymer Science and Technology

Volumn 13, Issue 2, 2000, Pages 339-344

  Fujigaya, Tsuyohiko ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dendrimer; Dissolution inhibitor; Image reversal; Photoresist; Poly(propyleneimine)

Indexed keywords

1 [1,1 BIS[4 [DIAZO 1(2H) NAPHTHALENONE 5 SULFONYLOXY]PHENYL]ETHYL] 4 [1 [4 [DIAZO 1(2H) NAPHTHALENONE 4 SULFONYLOXY]PHENYL]METHYLETHYL]BENZENE; BENZENE DERIVATIVE; DENDRIMER; POLYPROPYLENE; POLYPROPYLENEIMINE; TETRAMETHYLAMMONIUM; UNCLASSIFIED DRUG;

AQUEOUS SOLUTION; ARTICLE; CHEMICAL REACTION; DISSOLUTION; FILM; IMAGE PROCESSING; PHOTOREACTIVITY;

EID: 0034584048     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.339     Document Type: Article

References (5)