Dendrimer-based chemically amplified resist materials

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Volumn 41, Issue 1, 2000, Pages 142-143

  Tully, David C ^a   Trimble, Alexander R ^a   Fréchet, Jean M J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC POLYMERS; ELECTRON BEAM LITHOGRAPHY; ELECTRON IRRADIATION; SOLUBILITY; SYNTHESIS (CHEMICAL);

DENDRIMERS;

MACROMOLECULES;

EID: 0033742386     PISSN: 00323934     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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