메뉴 건너뛰기




Volumn 48, Issue 3, 2001, Pages 573-580

Effects of annealing on Ti, Pd, and Ni/n-Al0.11Ga0.89N Schottky diodes

Author keywords

AFM; AlGaN; Annealing; Schottky diode

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ELECTRIC CURRENT MEASUREMENT; SEMICONDUCTING ALUMINUM COMPOUNDS; SURFACE ROUGHNESS;

EID: 0035278833     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.906453     Document Type: Article
Times cited : (79)

References (20)
  • 6
    • 0000722194 scopus 로고    scopus 로고
    • Dependence of Ni/AlGaN Schottky barrier height on Al mole fraction
    • (2000) J. Appl. Phys. , vol.87 , pp. 801-804
    • Qiao, D.1
  • 10
    • 0001181554 scopus 로고    scopus 로고
    • Schottky contact and the thermal stability of Ni on n-type GaN
    • (1996) J. Appl. Phys. , vol.80 , pp. 1623-1627
    • Guo, J.D.1
  • 11
    • 0033682768 scopus 로고    scopus 로고
    • Investigations on strained AlGaN/GaN/Sapphire and GaInN multi-quantum well surface LED's using AlGaN/GaN Bragg reflectors
    • (2000) IEICE Trans. Electron. , vol.E83-C , pp. 591-597
    • Ishikawa, H.1
  • 19
    • 0001349285 scopus 로고    scopus 로고
    • Effects of thermal annealing on the indium tin oxide Schottky contacts of n-GaN
    • (1998) Appl. Phys. Lett. , vol.72 , pp. 3317-3319
    • Sheu, J.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.