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Volumn 35, Issue 9, 1999, Pages 745-746

Characterization of rhenium Schottky contacts on n-type AlxGa1-xN

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RHENIUM; SAPPHIRE; SCHOTTKY BARRIER DIODES; SEMICONDUCTING ALUMINUM COMPOUNDS; SUBSTRATES;

EID: 0032637268     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19990489     Document Type: Article
Times cited : (19)

References (10)
  • 2
    • 0032067341 scopus 로고    scopus 로고
    • A review of the metal-GaN contact technology
    • LIU, Q.Z., and LAU, S.S.: 'A review of the metal-GaN contact technology', Solid State Electron., 1998, 42, (5), pp. 677-691
    • (1998) Solid State Electron. , vol.42 , Issue.5 , pp. 677-691
    • Liu, Q.Z.1    Lau, S.S.2
  • 3
    • 0000441989 scopus 로고    scopus 로고
    • Estimated phase equilibria in the transition metal-Ga-N systems: Consequences for electrical contacts to GaN
    • MOHNEY, S.E., and LIN, X.: 'Estimated phase equilibria in the transition metal-Ga-N systems: consequences for electrical contacts to GaN', J. Electron. Mater., 1996, 25, (5), pp. 811-818
    • (1996) J. Electron. Mater. , vol.25 , Issue.5 , pp. 811-818
    • Mohney, S.E.1    Lin, X.2
  • 4
    • 0000820280 scopus 로고    scopus 로고
    • Thermally stable rhenium Schottky contacts to n-GaN
    • VENUGOPALAN, H.S., and MOHNEY, S.E.: 'Thermally stable rhenium Schottky contacts to n-GaN', Appl. Phys. Lett., 1998, 73, (9), pp. 1242-1244
    • (1998) Appl. Phys. Lett. , vol.73 , Issue.9 , pp. 1242-1244
    • Venugopalan, H.S.1    Mohney, S.E.2
  • 6
    • 0032181962 scopus 로고    scopus 로고
    • Growth and applications of group-III nitrides
    • AMBACHER, O.: 'Growth and applications of group-III nitrides', J. Phys. D, 1998, 31, pp. 2653-2710
    • (1998) J. Phys. D , vol.31 , pp. 2653-2710
    • Ambacher, O.1
  • 8
    • 0000298097 scopus 로고    scopus 로고
    • Electron affinity at aluminum nitride surfaces
    • WU, C.I., KAHN, A., HEILMAN, E.S., and BUCHANAN, D.N.E.: 'Electron affinity at aluminum nitride surfaces', Appl. Phys. Lett., 1998, 73, (10), pp. 1346-1348
    • (1998) Appl. Phys. Lett. , vol.73 , Issue.10 , pp. 1346-1348
    • Wu, C.I.1    Kahn, A.2    Heilman, E.S.3    Buchanan, D.N.E.4
  • 10
    • 36449003609 scopus 로고
    • Observation of a negative electron affinity for heteroepitaxial AIN on 6H-SiC(0001)
    • BENJAMIN, M.C., WANG, C., DAVIS, R.F., and NEMANICH, R.J.: 'Observation of a negative electron affinity for heteroepitaxial AIN on 6H-SiC(0001)', Appl. Phys. Lett., 1994, 64, (24), pp. 3288-3290
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.24 , pp. 3288-3290
    • Benjamin, M.C.1    Wang, C.2    Davis, R.F.3    Nemanich, R.J.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.