Optical, electrical and mechanical properties of nitrogen-rich carbon nitride films deposited by inductively coupled plasma chemical vapor deposition

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 156-162

  Popov, C ^a   Zambov, L M ^a   Plass, M F ^a   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CURRENT VOLTAGE CHARACTERISTICS; NITRIDES; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; STRESS ANALYSIS; THIN FILMS; TRANSPORT PROPERTIES; WEAR RESISTANCE;

INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION;

PROTECTIVE COATINGS;

EID: 0034509528     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01316-X     Document Type: Article

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