Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

Applied Physics Letters

Volumn 68, Issue 19, 1996, Pages 2645-2647

  Franceschini, D F ^a   Freire, F L ^a   Silva, S R P ^b  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000616477     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116268     Document Type: Article

References (20)

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