Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride thin films

Applied Physics Letters

Volumn 74, Issue 22, 1999, Pages 3290-3292

  Holloway, B C ^a   Kraft, O ^b   Shuh, D K ^c   Kelly, M A ^d   Nix, W D ^d   Pianetta, P ^d   Hagstrom S ^d  

^a The College of William and Mary   (United States)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CARBON; ELASTIC MODULI; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; NITRIDES; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE;

AMORPHOUS FILMS;

EID: 0032607450     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123362     Document Type: Article

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