Gas-sensitive properties of nitrogen-rich carbon nitride films

Advanced Materials

Volumn 12, Issue 9, 2000, Pages 656-660

  Zambov, Ludmil M ^a   Popov, Cyril ^a   Abedinov, Nikolai ^a   Plass, Martin F ^a   Kulisch, Wilhelm ^a   Gotszalk, Teodor ^a   Grabiec, Peter ^a   Rangelow, Ivo W ^a   Kassing, Rainer ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ADSORPTION; MICROELECTROMECHANICAL DEVICES; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE FILMS; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION (ICP-CVD);

PROTECTIVE COATINGS;

EID: 0033751649     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(200005)12:9<656::AID-ADMA656>3.0.CO;2-S     Document Type: Article

References (31)

1. Sensors (Eds: W. Göpel, T. Jones, M. Kleitz, I. Lundström, T. Seiyama), Wiley-VCH, Weinheim 1998, Vol. 3, Part II.
2. Sensors Update (Eds: H. Baltes, W. Göpel, J. Hesse), Wiley-VCH, Weinheim 1998, Vol. 2.
3. Sensors (Ed: W. Göpel), VCH, Weinheim 1991, Vol. 2.
4. N. Dayan, S. Sainkar, R. Karekar, R. Aiyer, Thin Solid Films 1998, 325, 254.
5. T. Kwon, S. Park, J. Ryu, H. Choi, Sens. Actuators 1998, B46, 75.
6. V. Aroutiounian, G. Aghababian, Sens. Actuators 1998, B50, 80.
7. Y. Nagasawa, K. Tabata, H. Ohnishi, Appl. Surf. Sci. 1997, 121/122, 327.
8. T. Thundat, R. Warmack, G. Chen, D. Allison, Appl. Phys. Lett. 1994, 64, 2894.
9. G. Chen, T. Thundat, E. Wachter, J. Warmack, J. Appl. Phys. 1995, 77, 3618.
10. H. Baltes, D. Lange, A. Koll, IEEE Spectrum 1998, Sept., 35.
11. A. Y. Liu, M. L. Cohen, Science 1989, 245, 841.
12. D. M. Teter, MRS Bull. 1998, Jan., 22.
13. A. Badzian, T. Badzian, Int. J. Refract. Met. Hard Mater. 1997, 15, 3.
14. C-M. Sung, M. Sung, Mater. Chem. Phys. 1996, 43, 1.
15. J. V. Badding, Adv. Mater. 1997, 9, 877.
16. R. C. DeVries, Mater. Res. Innovat. 1997, 1, 161.
17. Z. J. Zhang, S. Fan, J. Huang, C. M. Lieber, Appl. Phys. Lett. 1996, 68, 2639.
18. E. J. Chi, J. Y. Shim, H. K. Baik, S. M. Lee, Appl. Phys. Lett. 1997, 71, 324.
19. H. Sjöström, L. Hultman, J.-E. Sundgren, S. V. Hainsworth, T. F. Page, G. S. A. M. Theunissen, J. Vac. Sci. Technol. A 1996, 14, 56.
20. C. Popov, M. F. Plass, A. Bergmaier, W. Kulisch, Appl. Phys. A 1999, 69, 241.
21. C. Popov, M. F. Plass, R. Kassing, W. Kulisch, Thin Solid Films 1999, 355-356, 406.
22. C. Popov, L. Zambov, M. F. Plass, W. Kulisch, Diamond Relat. Mater. 2000, in press.
23. B. Ivanov, L. Zambov, G. Georgiev, C. Popov, M. F. Plass, W. Kulisch, Chem. Vap. Deposition 1999, 5, 265.
24. L. Zambov, B. Ivanov, G. Georgiev, C. Popov, V. Vassilev, G. Beshkov, J. Phys. IV 1999, 9, Pr8-501.
25. S. Mrowec, in Defects and Diffusion in Solids, Elsevier-Science, New York 1980.
26. B. Tareev, in Physics of Dielectric Materials, Mir. Moscow 1979.
27. T. Gotszalk, N. Abedinov, W. Barth, E. Lorenz, P. Hudek, T. Debski, P. Janus, P. Grabiec, M. Zaborowski, I. W. Rangelov, Microelectron. Eng., in press.
28. R. Linnemann, T. Gotszalk, L. Hadjiiski, I. W. Rangelow, Thin Solid Films 1995, 264, 159.
29. T. Gotszalk, P. Grabiec, I. Rangelow, Ultramicroscopy 2000, 82, 39.
30. F. MacRitchie, in Chemistrv at Interfaces, Academic Press, San Diego, CA 1989.
31. L. Ley, M. Cardona, R. Pollack, in Photoemission in Solids II (Eds: L. Ley, M. Cardona), Springer, Berlin 1979, Topics in Applied Physics, Vol. 27, pp. 11-172.