Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 114-123

  Naulleau, Patrick ^a   Goldberg, Kenneth ^a   Lee, Sang ^a   Chang, Chang ^a   Bresloff, Cynthia ^a   Batson, Phillip ^a   Attwood, David ^a   Bokor, Jeffrey ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Accuracy; Extreme ultraviolet lithography; Interferometry; Phase shifting interferometry; Point diffraction interferometry

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; GEOMETRICAL OPTICS; PHASE SHIFT; PROJECTION SYSTEMS; RANDOM PROCESSES; ULTRAVIOLET RADIATION;

POINT DIFFRACTIONS;

INTERFEROMETRY;

EID: 0032401461     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309563     Document Type: Conference Paper

References (9)

1. The elusive diffraction limit
2. Phase-measuring interferometry using extreme ultraviolet radiation
3. Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing
4. At-wavelength interferometry for EUV lithography
5. Characterization of an EUV schwarzschild objective using phase-shifting point diffraction interferometry
6. Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics
7. Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography
8. A 3-D numerical study of pinhole diffraction to predict the accuracy of EUV point diffraction interferometry